GPL-UV1021(Left) GPL-UV1031(Right)Product physical drawing
Product attributes:2.6:1 Wide spectrum plate making lens
Object field of view:21mm X 11 mm
Lens focal length / magnification:2.6X (Fine tuning 0.1%) .Lock after adjustment.
Product characteristics:The product has the advantages of diffraction limited imaging quality, high resolution, large field of view, small distortion and high performance.
Application scope:It is suitable for microelectronics production, projection lithography, etc.
GPL-UV1031 Product dimension drawing
GPL-UV2031B Product dimension drawing
Lithography objective is the core part of projection lithography machine in microelectronics production. With the development of microelectronics production technology to micro refinement and integration, the requirements of lithography lens are higher and higher. The image quality, high resolution, large field of view and small distortion with diffraction limit are required, and its performance directly determines the pattern transfer ability of the lithography machine. In addition to designing a perfect imaging optical system and selecting high-quality optical glass, the key to manufacturing photolithography objective lens lies in optical processing, structural design and assembly, and related testing technology.
At present, only a few multinational companies are able to produce large aperture lithography lenses for ArF laser machines, such as canon and Nikon in Japan, ASM in the Netherlands, SVG in the United States, etc.